I-Alumina-Based Porous Ceramic Vacuum Chuck yokuphatha i-Thin Wafer
I-chuck ye-alumina esekwe kwi-alumina yenziwe nge-99.6% ye-Al₂O₃ ecocekileyo kakhulu ene-porosity evulekileyo elawulwayo ye-30–45% kunye nobukhulu obufanayo be-pore ukusuka kwi-10 ukuya kwi-50 μm. Ngokungafaniyo nee-chucks ezine-grooved, umphezulu we-porous ubonelela nge-vacuum esasazekileyo kuyo yonke i-wafer ngasemva, ukuphelisa uphawu lomphetho kwaye uvumela ukubanjwa ngobunono kwee-wafers ezincinci kakhulu (≤100 μm) okanye ezigobileyo. Le nto inika amandla okugoba angama-≥250 MPa kunye nozinzo lobushushu olufikelela kwi-400°C emoyeni.
Iinkcukacha(isekelwe kwi-99.6% Al₂O₃):
| Ipropati | Ixabiso |
| Izinto eziphathekayo | I-99.6% ye-Alumina (Emhlophe) |
| Ukugquma | 30–45% (iyalungiseka) |
| Ubungakanani bePore ephakathi | 10–50 μm |
| Amandla okuGuquka | ≥250 MPa |
| Uxinano | 3.88 g/cm³ |
| Ubude (ngaphezulu kwe-200mm) | ≤5 μm |
| Ubushushu obuphezulu bokusebenza | 400°C (umoya) |
| Umphezulu wokugqiba | I-Lapped (Ra ≤0.8 μm) |
Izicelo:
- · I-wafer encinci (≤50 μm) yokusila ngasemva
- · Ukufakelwa kwe-wafer egobileyo ukuze kunqunyulwe
- · Ukucholwa kweedayi ezifakwe ngesandla
- · Ukuphathwa kwe-substrate yeglasi
Ukuvelisa:
Umgubo oxutywe nee-pore formers → isostatic pressing → sintering kwi-1600°C → lapping ukuya kubukhulu bokugqibela. I-chuck nganye ivavanywa ukuhamba kwamanzi ukuze ibone ukuba i-vacuum iyafana na (pressure deviation <5%) kwaye ihlolwe ukuba i-pore size distribution (SEM).
Iingenelo ngaphezu kwee-chucks zesiqhelo:
- · Akukho phawu lwe-wafer okanye i-die shift
- · Ibamba iiwafers ezine-bow ukuya kuthi ga kwi-500 μm
- · Umphezulu ozihlambululayo (iimbobo azikwazi ukuvaleka)
- · Inkxaso efanayo isusa uxinzelelo lwendawo
Cuhlengahlengiso:
Imilo engqukuva okanye enesikwere, ububanzi bayo buyi-100–450 mm. Isangqa sokutywina umphetho siyafumaneka ukuze silawule i-vacuum eneendawo ezahlukeneyo.
Cela isampuli yobukhulu be-wafer yakho ethile.
